設備名稱 Equipment Name

管式硼擴散爐  Horizontal Boron Diffusion Furnace

設備型號 Equipment Model

DOA-420

設備用途 Equipment Application

主要用于晶體硅太陽能電池制造中硅片的摻雜形成PN結。
The Equipment Is Mainly Used For Doping And Form Pn Junctions On Silicon Wafers In The Manufacturing Process Of Crystalline Silicon Solar Cells.

工藝流程  Process Flow

石英舟及硅片準備→插片→上料→選擇工藝運行→進舟→抽真空→升溫穩定→通氧→通源→推進→恒溫→出舟→下舟冷卻→測試→卸片
Prepare quartz boat & wafers→Insert wafers→Loading wafers→Choose recipe→Boat loading→tube Vacuuming→Temperature rising→Oxygen inlet→BBr3/BCL3 inlet→Push in→DOA treatment→Boat unloading→Cooling→Testing→Wafer unloading

技術特點  Features

1、高溫硼擴散功能。
High temperature boron diffusion.

2、BBr3、BCL3。
BBr3、BCL3.

3、配套相關專利技術。
Patented technology.

4、獨特雙嵌套爐門結構。
Unique double-layer-nested furnace door structure.

5、專利技術尾氣處理系統。
Patented technology for exhaust gas treatment system.

6、高速平穩整體模組推舟機構。
High-speed integral module boat pushing mechanism.

7、智能化全自動控制。
Intelligent automatic control.

8、自主知識產權MES軟件。

MES software with independent intellectual property right.

9、全面的防超溫、斷偶、撞舟等安全報警保護功能。
Comprehensive safety alarm protection functions such as over-temperature prevention, broken thermocouple, and boat collision.

10、匹配S.C智能化生產管理系統。
Compatible with S.C smart factory solution.

設備參數  Parameters